AT650/850P
Cost effective, Desktop Plasma ALD
- Plasma ALD at the cost of a thermal system
- Now with a new advanced hollow cathode source and 60 MHz RF
- Featuring: low oxygen contamination (in nitrides, etc..), high electron density, low plasma damage
- Small Footprint (38.1 cm; 15″ across) Desktop Plasma ALD
• Accommodates samples of 6″ diameter or smaller.- Optional customizable chucks.
- 4 organometallic source precursors to 175 °C.
- Up to 4 oxidant/reductant sources (MFC controlled).
- High-temperature-compatible fast-pulsing ALD valves with ultrafast MFC for
integrated inert gas purge - Temperature range to 450 °C (up to 580 °C available)
- High exposure available with static processing mode
- Small Footprint (38.1 cm; 15″ across) Desktop Plasma ALD
- High efficiency, remote 300 watt hollow cathode source and 60 MHz RF generator
-
Features: low oxygen contamination, high electron density, low plasma damage
-
- Integrated matching network
- Accommodates samples of 6″ diameter with optional customizable chucks.
- Warm walled aluminum chamber with heated sample holder from 40 – 450 °C (580 °C available)
- 4 organometallic precursors can be heated to 175 °C.
- Up to 4 oxidant/reductant sources each with ultrafast MFCs (2 standard)
- High temperature compatible fast pulsing ALD valves with an ultrafast MFC and
integrated inert gas purge - High exposure available with static processing mode
- Substrate temperatures from 40 to 450 °C ± 1 °C (580 °C optional) ; Precursor temperatures from RT to 175 °C ± 2 °C (w/ heating jacket)
- Small footprint (15″ by 15″), bench top installation and fully cleanroom compatible
- Simple system maintenance and low utilities cost.
- Streamlined chamber design and small chamber volume
- Fast cycling capability and high exposure, deep penetration processing available
- Full HW and SW interlocks for safe operation even in multi-user environment.
- Customized chuck/platen
- High temperature chuck up to 580 °C
- QCM (Quartz Crystal Microbalance)
- Additional Counter reactant lines (MFC controlled) – up to 2 additional
- Optional bubbler available with pressure boost technology
- Load lock (or glove box integration)
- External control – PC/software link (allows programming and running, remotely)
- Higher than standard pressure regime
Customized systems
- For detailed instructions see our presentation and video instructions: “AT650P Installation and Start-up“
- N2 purge gas should be >99.9995% with a shutoff valve (regulated to 10 – 30 psi, metal sealed).
- Input line is 1/4 female VCR compression fitting
- Attach > 99.9995% nitrogen (UHP) purge gas via 1/4″ metal line to the 1/4″ compression fitting on back
- Attach 90-110 psi CDA (clean dry air) via 1/4″ polyethylene tubing or metal line to the other 1/4″ compression fitting marked CDA (Clean Dry Air)
- Min 19.5cfm wet pump (**PTFE vacuum fluid (like Fomblin) required) (Dry pump is optional)
- NW40 (1.5″) connection and also exhaust line (with > 5cfm draw)
- Greater than 1 meter should use NW50 exhaust line
- Precursor’s attach via female VCR elbows (always use new gaskets).
- Elbow: 1/4″ gasket first (with gloves on)
- For precursor attachment please refer to “AT650P Tool and Software Operation”
For detailed instructions see our presentation and video instructions: “AT650P Installation and Start-up“
- Human Machine Interface (HMI) PLC system with a 10” touch screen
panel - Advanced controls suitable for the deposition of standard ALD cycles as
well as e.g. Nanolaminates, Doped Thin Films and Ternary Thin Films - Recipe database for high quality, tested processes
- Custom recipe input screen
- Real time display of process status
- Individually programmable heated source temperatures
- Built-in pulsing sequences for ternary compounds and nano-laminates
- Quick running with simple questions to get user going
- Input subcycles and overall cycles
Request a Quote
START A CONVERSATION
[/av_textblock] [av_button label='Contact Us' icon_select='no' icon='ue800' font='entypo-fontello' link='page,263' link_target='' size='small' position='right' label_display='' title_attr='' size-text='' av-desktop-font-size-text='' av-medium-font-size-text='' av-small-font-size-text='' av-mini-font-size-text='' margin='' margin_sync='true' padding='' padding_sync='true' av-desktop-margin='' av-desktop-margin_sync='true' av-desktop-padding='' av-desktop-padding_sync='true' av-medium-margin='' av-medium-margin_sync='true' av-medium-padding='' av-medium-padding_sync='true' av-small-margin='' av-small-margin_sync='true' av-small-padding='' av-small-padding_sync='true' av-mini-margin='' av-mini-margin_sync='true' av-mini-padding='' av-mini-padding_sync='true' color_options='' color='light' custom_bg='#444444' custom_font='#ffffff' btn_color_bg='theme-color' btn_custom_grad_direction='vertical' btn_custom_grad_1='#000000' btn_custom_grad_2='#ffffff' btn_custom_grad_3='' btn_custom_grad_opacity='0.7' btn_custom_bg='#444444' btn_color_bg_hover='theme-color-highlight' btn_custom_bg_hover='#444444' btn_color_font='theme-color' btn_custom_font='#ffffff' btn_color_font_hover='white' btn_custom_font_hover='#ffffff' border='' border_width='' border_width_sync='true' border_color='' border_radius='' border_radius_sync='true' box_shadow='' box_shadow_style='0px,0px,0px,0px' box_shadow_color='' animation='' animation_duration='' animation_custom_bg_color='' animation_z_index_curtain='100' hover_opacity='' sonar_effect_effect='' sonar_effect_color='' sonar_effect_duration='1' sonar_effect_scale='' sonar_effect_opac='0.5' css_position='' css_position_location=',,,' css_position_z_index='' av-desktop-css_position='' av-desktop-css_position_location=',,,' av-desktop-css_position_z_index='' av-medium-css_position='' av-medium-css_position_location=',,,' av-medium-css_position_z_index='' av-small-css_position='' av-small-css_position_location=',,,' av-small-css_position_z_index='' av-mini-css_position='' av-mini-css_position_location=',,,' av-mini-css_position_z_index='' id='' custom_class='cta-box-button-col' template_class='' av_uid='av-lbwdmshy' sc_version='1.0' admin_preview_bg=''] [/av_one_full][/av_section]
AT-OZONE Generator
The ATOzone (Ozone Generator) system utilizes high quality components that deliver high concentration (up to 12%) ozone in a very small form. The system does not require expensive and bulky water cooling. The built-in high velocity fans keep the plasma cell cool even during prolonged or constant use. Manual or automatic switching between ozone, oxygen and off positions.
- Ozone production range: 12% by weight at low flow, 6% at high flow.
- Integrated O2 regulator: 3 – 29 psi
- High capacity ozone destructor for off-cycle ozone flow
- Can be controlled by 3 – 24V input signal
- Override switch for manual ozone control
- Front panel switch for O2 or Ozone output selection
- Ozone production range: 12% by weight at low flow (250 sccm) to 6% at high flow (2500 sccm)
- Corona cell made from aluminum w/ ceramic dielectric
- Operating Frequency: 5,000 – 30,000 Hz
- Oxygen/Ozone Flow Range: 25 – 2500 sccm w panel integrated flow control
- Integrated O2 regulator: 3-29 psi range
- 3-24V DC input signal required for automatic ozone control
- 110 – 220 VAC, 60/50 Hz, 2A
- Weight 15 lbs
- Dimensions: 10.3” W x 7.5” H x 20” D
Ozone Safety Monitor
-
- Monitored and integrated with AT series system
- Detects up to 5000ppb or 5ppm
- Green: ozone level is below 1500 ppb
- Yellow: ozone level 1500ppb to 3500 ppb
- Red: ozone level greater than 3500ppb
- Real time detection of ambient ozone gas
- Temperature & Humidity detection
- Wall mount with LCD display
- Provides one on/off dry contact relay output to control ozone generator
- Will come prewired to the ozone generator for automatic shutoff
- See ATOzone – Installation and Operation Manual for exact details and more safety precautions:
- Input of 98+% oxygen recommended (at least 90% pure required) at back input tube (1/4″ Swagelok compression fitting)
- Exhaust port (1/4″ Swagelok compression fitting) capable of handling 0.5 scfh of pure O2 to the appropriate roof top exhaust or equivalent.
- Ozone comes out of front port (1/4″ Swagelok compression fitting) and should be connected to ALD tool (which is also properly exhausted).
- Connect power cable to back (standard 110-220VAC)
- Turn (O2) pressure valve on front to 15 psi and gauge to 0.2 to 0.4 scfh
- Switch at front should now be positioned to O3 (ozone)
- If all connections have already been made then when a + 3 to 24V control signal is given the valve controlling O2 flow will open (ozone will be generated). Make sure exhaust is hooked up properly, beforehand! DO NOT EXHAUST TO ROOM AT ANY TIME.
- Ozone can also be produced by lifting red protector on back and flipping manual ozone switch up.
– Now turning on the front panel ozone switch (O3) will send ozone to the front port (into properly exhausted ALD tool). - Closing protective flap on back shuts off the ozone.
- Always keep a positive pressure of oxygen flowing on the system when connected to a vacuum system. Pulling a vacuum on the ATOzone system will void warranty.
Request a Quote
START A CONVERSATION
[/av_textblock] [av_button label='Contact Us' icon_select='no' icon='ue800' font='entypo-fontello' link='page,263' link_target='' size='small' position='right' label_display='' title_attr='' size-text='' av-desktop-font-size-text='' av-medium-font-size-text='' av-small-font-size-text='' av-mini-font-size-text='' margin='' margin_sync='true' padding='' padding_sync='true' av-desktop-margin='' av-desktop-margin_sync='true' av-desktop-padding='' av-desktop-padding_sync='true' av-medium-margin='' av-medium-margin_sync='true' av-medium-padding='' av-medium-padding_sync='true' av-small-margin='' av-small-margin_sync='true' av-small-padding='' av-small-padding_sync='true' av-mini-margin='' av-mini-margin_sync='true' av-mini-padding='' av-mini-padding_sync='true' color_options='' color='light' custom_bg='#444444' custom_font='#ffffff' btn_color_bg='theme-color' btn_custom_grad_direction='vertical' btn_custom_grad_1='#000000' btn_custom_grad_2='#ffffff' btn_custom_grad_3='' btn_custom_grad_opacity='0.7' btn_custom_bg='#444444' btn_color_bg_hover='theme-color-highlight' btn_custom_bg_hover='#444444' btn_color_font='theme-color' btn_custom_font='#ffffff' btn_color_font_hover='white' btn_custom_font_hover='#ffffff' border='' border_width='' border_width_sync='true' border_color='' border_radius='' border_radius_sync='true' box_shadow='' box_shadow_style='0px,0px,0px,0px' box_shadow_color='' animation='' animation_duration='' animation_custom_bg_color='' animation_z_index_curtain='100' hover_opacity='' sonar_effect_effect='' sonar_effect_color='' sonar_effect_duration='1' sonar_effect_scale='' sonar_effect_opac='0.5' css_position='' css_position_location=',,,' css_position_z_index='' av-desktop-css_position='' av-desktop-css_position_location=',,,' av-desktop-css_position_z_index='' av-medium-css_position='' av-medium-css_position_location=',,,' av-medium-css_position_z_index='' av-small-css_position='' av-small-css_position_location=',,,' av-small-css_position_z_index='' av-mini-css_position='' av-mini-css_position_location=',,,' av-mini-css_position_z_index='' id='' custom_class='cta-box-button-col' template_class='' av_uid='av-lbwdmshy' sc_version='1.0' admin_preview_bg=''] [/av_one_full][/av_section]
AT610
The AT610 is the most cost-effective 6″ thermal ALD tool on the market.
- Small Footprint Desktop System
- Semiconductor-grade metal sealed lines and high temperature compatible fast pulsing ALD valves.
- Ultrafast MFC for integrated inert gas purge.
- 6 inch circular chuck (up to 7″ square) customizable for smaller sizes or other shapes (11 mm tall).
- 3 organometallic precursors and 2 (up to 3) counter reactants.
- Heated lines throughout (from precursor to chamber).
- All aluminum (semiconductor grade) chamber ‒ range up to 310°C
- 7” touchscreen PLC controller (no PC required).
- Small Footprint Desktop System, cleanroom compatible.
- All aluminum (semiconductor grade) chamber ‒ range up to 310°C
- High temperature semiconductor grade fast pulsing ALD valves with ultrafast MFC for integrated inert gas purge.
- 6″ circular chuck (7″ square)customizable for smaller sizes or other shapes (11 mm tall).
- Streamlined chamber design and small chamber volume
- 3 organometallic precursors and 2 (up to 3) counter reactants.
- Precursors can be heated to 150°C.
- Heated lines throughout (from precursor through to chamber).
- Simple system maintenance and lowest utilities and precursor usage on market
- High exposure (for trenches and porous substrates) and static processing mode
- 7″ touchscreen PLC controller (no PC required)
- Chamber temperatures from RT to 300°C ± 1°C
- Precursor temperatures from RT to 150°C ± 2°C (w/ heating jacket)
- Smallest footprint on market, bench top installation and cleanroom compatible
- Simple system maintenance and lowest utilities and precursor usage on market
- Streamlined chamber design and small chamber volume
- Fast cycling capability and high exposure, deep penetration processing available
- All metal sealed from precursor to chamber.
- Typical Operating Pressure
- Full HW and SW interlocks for safe operation in multi-user environment
- 110 – 220 VAC, single phase, 50/60Hz, 15 Amp (10A for 220V)
- Weight approximately 100lbs (45 kgs)
- Customized chuck/platen (square, indents for smaller pieces, powders)
- Customized chamber (thicker substrates)
- ATOzone – Ozone generator (required for some films: Pt, Ir, SiO2, MoO2, high quality Al2O3 below 60°C, high quality HfO2)
- Optional – Ozone Safety Monitor w real time detection of ambient ozone gas
- QCM (Quartz Crystal Microbalance)
- Glovebox integration (typically required to not expose substrate to moisture; Sulfides, etc..)
- External control – PC/software link (allows programing and running, remotely)
- Ventable Precursor cabinet
- Spare Chamber
- IGPA (inert gas pressure assist)for low vapor pressure precursors
- Higher temperatures on precursors (to 180°C)
- Third counter reactant
- Software control of third counter reactant
- For detailed instructions see our presentation and video instructions: “AT410/610 Installation and Start-up“
- N2 purge gas should be >99.9995% with a shutoff valve (regulated to 10 – 30 psi, metal sealed), .
- Input line is 1/4 female VCR compression fitting
- Attach > 99.9995% nitrogen (UHP) purge gas via 1/4″ metal line to the 1/4″ compression fitting on back
- Attach 90-110 psi CDA (clean dry air) via 1/4″ polyethylene tubing or metal line to the other 1/4″ compression fitting marked CDA (Clean Dry Air)
- Min 12cfm wet pump (**PTFE vacuum fluid (like Fomblin) required) (610 and 810 use larger pumps typically 19.5 cfm or higher)
- NW25 (KF25) (1″) connection and also exhaust line (with > 5cfm draw)
- Greater than 1 meter should use NW40 (1.5″) exhaust line
- Precursor’s attach via female VCR elbows (always use new gaskets).
- Elbow: 1/4″ gasket first (with gloves on)
- For precursor attachment please refer to AT410/AT610 Tool and Software Operation.
- For detailed instructions see our presentation and video instructions: “AT610 Installation and Start-up“
- Human Machine Interface (HMI) PLC system with a 7” touch screen
panel - Advanced controls suitable for the deposition of standard ALD cycles as
well as e.g. Nanolaminates, Doped Thin Films and Ternary Thin Films - Recipe database for high quality, tested processes
- Custom recipe input screen
- Real time display of process status
- Individually programmable heated source temperatures
- Built-in pulsing sequences for ternary compounds and nano-laminates
- Quick running with simple questions to get user going
- Input subcycles and overall cycles
- Human Machine Interface (HMI) PLC system with a 7” touch screen
Request a Quote
