Anric Technologies is a leading manufacturer of Atomic Layer Deposition (ALD) systems, offering compact, high-performance tools designed for research, development, and low-volume production. Whether you’re part of a university lab, a startup, or a corporate R&D team, our systems are built to deliver precision and reliability at a practical scale.
Custom-Engineered ALD Systems
Our product line includes a diverse range of thermal and plasma-enhanced ALD systems. From the benchtop AT200M, ideal for educational environments and small-scale material studies, to the AT650/850P, a plasma-enhanced model engineered for fast and uniform deposition on up to 8-inch substrates — we provide tailored solutions for nearly every ALD thin-film application.
Each tool is designed with modularity and user accessibility in mind. This allows researchers to adapt the system to specific materials and process requirements, while benefiting from streamlined operation, robust software, and minimal maintenance overhead
Precision, Performance, and Accessibility
What sets Anric apart is our commitment to combining scientific-grade performance with real-world practicality. Our systems are capable of producing ultra-thin, conformal films with atomic-level precision — yet they remain compact, cost-effective, and easy to operate. This balance enables innovation at all scales, without requiring large capital investments or dedicated facilities.
In addition to product performance, we provide deep technical support — from installation and training to process optimization. Our team has decades of experience in ALD and thin-film technologies, and we work closely with every client to ensure long-term success.
Applications
Our ALD systems are utilized across various industries, including:
- Microelectronics
- Photovoltaics
- Supercapacitors
- Biodevices
- Quantum electronics
- Radiation sensors
- MEMS (Microelectromechanical Systems)
Get Started
Ready to take your ALD research or production to the next level? Get in touch with our team to learn more about available systems, customization options, or to request a demo or quote.
FAQs
What is Atomic Layer Deposition (ALD)?
ALD is a vapor-phase technique used to deposit ultra-thin films with atomic-level control. The process is based on sequential, self-limiting chemical reactions, allowing for exceptional conformality and thickness precision, even on complex surfaces.
What industries use ALD?
ALD is widely used in microelectronics, photovoltaics, energy storage, biotechnology, MEMS, and advanced materials research. As devices continue to shrink and material interfaces become more critical, ALD plays an increasingly vital role in product development and innovation.
Do you offer training and technical support?
Absolutely. Every system comes with installation support and on-site or remote training. We also provide long-term service plans, remote diagnostics, and application-specific consulting as needed.
How do I choose the right ALD system?
Choosing the right system depends on several factors: substrate size, desired film properties, precursor compatibility, and whether you need thermal or plasma-enhanced ALD. Our team is happy to walk you through the decision process and recommend a configuration tailored to your needs.
