Systems
Anric Technologies has a full line of desktop equipment for research to pilot line, from thermal ALD to plasma ALD.
AT200M
Compact and Versatile
The AT200M is the smallest footprint ALD tool, ideal for installing in a glovebox or attaching to the side. Despite its compact size, it offers robust performance with semiconductor-grade components, making it suitable for research environments where space is limited. Options such as particle coating, high temperatures (up to 500 C), or plasma are available.
AT410
Cost-Effective Thermal ALD
Designed for 4-inch substrates, the AT410 provides an affordable solution for thermal ALD applications. Its customizable chucks and chambers accommodate various sample types, including 3D parts, optics, electronic packaging or square substrates making it versatile for different research needs.
AT650/850P
Desktop Plasma ALD System
The AT650/850P is a compact desktop plasma ALD system that delivers high-quality films with deep penetration. The system can process smaller wafers up to 8 inches for the AT 850P. It features a hollow cathode plasma source and a 60 MHz RF generator, providing high electron density and low plasma damage, suitable for applications requiring precise film characteristics.
AT650/850T
Thermal ALD with Upgrade Path to Plasma
The AT650/850T offers thermal ALD capabilities with the option to upgrade to plasma ALD. The system can process smaller wafers up to 8 inches for the AT 850T.This flexibility allows users to start with thermal processes and transition to plasma-enhanced deposition as their research or production needs evolve
AT-OZONE Generator
Anric Technologies’ ATOzone (Ozone Generator) system utilizes high quality components that deliver high concentration (up to 12%) ozone in a very small form.
AT610
Enhanced Performance for 6-Inch Substrates
The AT610 is optimized for 6-inch substrates or up to 210 x 210 mm square, offering improved thermal performance and enhanced precursor delivery systems. This system is ideal for applications requiring precise film deposition on larger wafers. Ask about our large batch system with up to 9 125 x 125mm substrates, double-sided deposition.
