ALD Equipment

Browse Our ALD Tools

Browse Anric Technologies’ full line of desktop ALD systems and equipment for research to pilot lines, from thermal ALD equipment to plasma ALD equipment. Shop by size and capability, or compare our systems using the button below.

AT200M

The AT200M (Small Enough to Fit in a Glovebox) is our smallest footprint ALD (Atomic Layer Deposition) tool available on the market.

AT410

The 4-inch AT410 model is the most cost-effective thermal ALD equipment on the market, with customizable chucks/platens or chambers (for 3D parts).

AT650P

The 6-inch AT650P is a cost-effective, desktop Plasma ALD system, with a downstream plasma.

AT650T

The AT650T is a 6-inch, cost-effective desktop thermal ALD system, with in-field upgradeability to plasma.

AT-OZONE Generator

Anric Technologies’ ATOzone (Ozone Generator) system utilizes high quality components that deliver high concentration (up to 12%) ozone in a very small form.

AT610

The AT610 is the most cost-effective 6 inch desktop thermal ALD tool on the market. Customizable chucks/chambers/platens (for small or 3D parts). Can hold square substrates.

AT810

The AT810 model is an 8-inch desktop thermal ALD system. Customizable chucks/chambers/platens (for small or 3D parts or multiples (batch runs)). Can hold square substrates.

ALD Systems Comparison

Compare ALD equipment and systems manufactured by Anric Technologies. Compare by size and capability.

AT200M AT410/610/810AT650TAT650P
Desktop (W: ~11” (27.9cm) x D: 15” (38.1cm) x H: 14.5” (36.8cm))Desktop (W: 24.5” (62.3cm) x D: 24” (61cm) x H: 15.75” (40.5cm))[610 D: 25″ (63.5cm)]Desktop (W: 15” (38.1cm) x D: 15” (38.1cm) x H: Less that 38” (96.5cm))Desktop (W: 15” (38.1cm) x D: 15” (38.1cm) x H: 38” (96.5cm))
Sample Size = 2 inch (x2) up to 2 x 2 x 2” volume 410 = 4 inch; 610 = 6 inch; 810 = 8 inch6 inch6 inch
Thermal to 300°CThermal to 320°CThermal to 400°C
(upgradeable to Plasma)
Plasma and Thermal to
400°C
One Precursor/One Counter
Reactant
Three Precursors/ Up to Three Counter
Reactants
Four Precursors/Four
Counter Reactants
Four Precursors/Four
Counter Reactants
Heated Precursor to 150°CHeated Precursor to 180°C (N2 Assist Available)3 Precursors to 185°C (with optional pressure boost) , 1 at RT3 Precursors to 185°C (with optional pressure boost) , 1 at RT
All stainless steel chamber and metal sealed stainless linesAll aluminum chamber (hot walled) and metal sealed stainless linesAll aluminum chamber (warm walled) and metal sealed stainless lines and chuckAll aluminum chamber (warm walled) and metal sealed stainless lines and chuck
Heated lines and fast pulsing ALD valvesHeated lines and fast pulsing ALD valvesHeated lines and fast pulsing ALD valvesHeated lines and fast pulsing ALD valves
Ultrafast MFCUltrafast MFCUp to four ultrafast MFCsUp to four ultrafast MFCs
5” Display w. Integrated
PLC
7“ Display with integrated
PLC
10“ Display with integrated
PLC
10“ Display with integrated
PLC

Have Questions About ALD Equipment?

Our team is here to help you find the right Atomic Layer Deposition system. Contact us today to start a conversation. If you don’t think we have the ALD equipment you need, you will be surprised!