AT200M
The AT200M (Small Enough to Fit in a Glovebox) is our smallest footprint ALD (Atomic Layer Deposition) tool available on the market.
Browse Anric Technologies’ full line of desktop ALD systems and equipment for research to pilot lines, from thermal ALD equipment to plasma ALD equipment. Shop by size and capability, or compare our systems using the button below.
AT410
The 4-inch AT410 model is the most cost-effective thermal ALD equipment on the market, with customizable chucks/platens or chambers (for 3D parts).
AT650T
The AT650T is a 6-inch, cost-effective desktop thermal ALD system, with in-field upgradeability to plasma.
AT-OZONE Generator
Anric Technologies’ ATOzone (Ozone Generator) system utilizes high quality components that deliver high concentration (up to 12%) ozone in a very small form.
AT610
The AT610 is the most cost-effective 6 inch desktop thermal ALD tool on the market. Customizable chucks/chambers/platens (for small or 3D parts). Can hold square substrates.
AT810
The AT810 model is an 8-inch desktop thermal ALD system. Customizable chucks/chambers/platens (for small or 3D parts or multiples (batch runs)). Can hold square substrates.
ALD Systems Comparison
Compare ALD equipment and systems manufactured by Anric Technologies. Compare by size and capability.
| AT200M | AT410/610/810 | AT650T | AT650P |
|---|---|---|---|
 |  |  |  |
| Desktop (W: ~11” (27.9cm) x D: 15” (38.1cm) x H: 14.5” (36.8cm)) | Desktop (W: 24.5” (62.3cm) x D: 24” (61cm) x H: 15.75” (40.5cm))[610 D: 25″ (63.5cm)] | Desktop (W: 15” (38.1cm) x D: 15” (38.1cm) x H: Less that 38” (96.5cm)) | Desktop (W: 15” (38.1cm) x D: 15” (38.1cm) x H: 38” (96.5cm)) |
| Sample Size = 2 inch (x2) up to 2 x 2 x 2” volume | 410 = 4 inch; 610 = 6 inch; 810 = 8 inch | 6 inch | 6 inch |
| Thermal to 300°C | Thermal to 320°C | Thermal to 400°C (upgradeable to Plasma) | Plasma and Thermal to 400°C |
| One Precursor/One Counter Reactant | Three Precursors/ Up to Three Counter Reactants | Four Precursors/Four Counter Reactants | Four Precursors/Four Counter Reactants |
| Heated Precursor to 150°C | Heated Precursor to 180°C (N2 Assist Available) | 3 Precursors to 185°C (with optional pressure boost) , 1 at RT | 3 Precursors to 185°C (with optional pressure boost) , 1 at RT |
| All stainless steel chamber and metal sealed stainless lines | All aluminum chamber (hot walled) and metal sealed stainless lines | All aluminum chamber (warm walled) and metal sealed stainless lines and chuck | All aluminum chamber (warm walled) and metal sealed stainless lines and chuck |
| Heated lines and fast pulsing ALD valves | Heated lines and fast pulsing ALD valves | Heated lines and fast pulsing ALD valves | Heated lines and fast pulsing ALD valves |
| Ultrafast MFC | Ultrafast MFC | Up to four ultrafast MFCs | Up to four ultrafast MFCs |
| 5” Display w. Integrated PLC | 7“ Display with integrated PLC | 10“ Display with integrated PLC | 10“ Display with integrated PLC |
Have Questions About ALD Equipment?
Our team is here to help you find the right Atomic Layer Deposition system. Contact us today to start a conversation. If you don’t think we have the ALD equipment you need, you will be surprised!
