Features & Specs
AT610
The tool boasts capabilities that meet or exceed those found in other tools on the market, while being easy to use and maintain - at a cost well below what can be found on the market today.

4”
UP TO
DIAMETER
SAMPLE
Variable Process
Pressure Control
0.1 to 1.5
TORR
UP TO
5
precursors
standard
HIGH
QULAITY
DESIGNED
for growth on small samples
ALL
METAL
Sealed System
Upstream of Sample
7"
TOUCHSCREEN
PLC control system
Precise
Precursor
Dosing with defined dose volumes
- Chamber temperatures from RT to 325 °C ± 1 °C; Precursor temperatures from RT to 150 °C ± 2 °C (w/ heating jacket)
- Smallest footprint on market (2.5 sq ft), bench top installation and cleanroom compatible
- Simple system maintenance and lowest utilities and precursor usage on market
- Streamlined chamber design and small chamber volume
- Fast cycling capability (up to 1.2nm/min Al2O3) and high exposure, deep penetration processing available
- Full HW and SW interlocks for safe operation even in multi-user environment
7"
12"
20"
28"
THE TOOL CAN DEPOSIT A WIDE BREADTH OF MATERIALS
MATERIAL CLASS | STANDARD RECIPES | RECIPES IN DEVELOPMENT | SYSTEM CAPABLE MATERIALS |
---|---|---|---|
Oxides (AxOy) | Al, Si, Ti, Zn, Zr, Hf | V, Y, Ru, In, Sn, Pt | Li, Be, Mg, Ca, Sc, Mn, Fe, Co, Ni, Cu, Ga, Sr Nb, Rh, Pd, Sn, Ba, La, Pr, Nd, Sm, Eu, Gd |
Elementals (A) | Ru, Pd, Pt, Ni, Co | Rh, Os, Ir | Fe, Cu, Mo |
Nitrides (AxNy) | Zr, Hf, W | Ti, Ta | Cu, Ga, Nb, Mo, In |
Sulfides (AxSy) | Ca, Ti, Mn, Cu, Zn, Sr, y, Cd, In, Sn, Sb, Ba, La, W | ||
Other Compounds | AZO (AL:ZnO), AxSiyOz ()A=Al, Zr, Hf | YSZ (yttria stabilized sirconia) ITO | Many others |
System ships with several of the standard recipes pre-loaded in the controller
Exact mix of recipes TBD during purchase discussion
Process development support available for all system capable materials and user defined device requirements
-
Precursor Bottle
-
System Controller
-
Tray
-
Glove Box Integration
-
Recipe Generation
-
Communications