Systems
Anric Technologies has a full line of desktop equipment for research to pilot line, from thermal ALD to plasma ALD.
Anric Technologies provides solutions to challenging thin film deposition applications. Anric Technologies provides the smallest footprint and the most cost-effective solution specifically for your requirements (customized to fit your need).
Anric Technologies ALD systems lead to fast, proof-of-concept solutions at the lowest cost. Our simple and reliable systems are easy to learn and flexible to quickly optimize your process.
For multiuser environments, the Anric Technologies ALD systems offer flexible material growth combinations, strong safety controls, and the best combination of price and capabilities on the market.
Nanolaminates (alternating layers of different materials) have shown themselves to solve issues of corrosion in batteries, fuel cells, electronic packaging, implantable biodevices, displays and solar cells. Modifying the thickness and materials can lead to extremely flexible materials that can survive environments where single thicker materials would see failure.
Atomic Layer Deposition technology allows one to grow pin-hole free conformal High-k dielectrics on Silicon, GaN or Graphene.
Plasma ALD allows for more freedom in the choice of materials and the use of plasma process to pre-treat (or clean) the surface prior to deposition. See how plasma ALD can make it easier to achieve your goals.