Anric technologies focuses on technology and innovation in the areas of thin film deposition with a special focus on Atomic Layer Deposition.
Anric Technologies provides solutions to challenging thin film deposition applications. Find out if ALD is right for you and how the Anric Technology deposition systems yield the optimal combination of speed, flexibility, and price.
Find out how an Anric Technologies ALD system leads to quick process development iterations, with the lowest COO, and simple yet flexible system control.
For multiuser environments, the Anric ALD systems offer flexible material growth combinations, strong safety controls, and the best combination of price and capabilities on the market.
Take a peek
Learn more about the growth mechanism for common ALD processes and details on some of the ALD processes and films grown by Anric Technology researchers as well as the rapidly expanding customer base.
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Design & Features
Small yet powerful
High concentration (up to 11% by weight), small footprint ozone generator for ALD and general ozone applications.
Equipped with pressure and flow control, manual output switch and automatic control utilizing an external voltage signal.
Built for safety
Built-in high capacity ozone destruct for safe handling of exhaust gas from system.
High quality growth of Ta2O5
Recipes have been developed for the ALD deposition of tantalum oxide for dielectric as well as imaging applications. Click on 'More' for an in-depth look at the properties of Ta2O5 grown on the AT400MORE
Advanced Simulation of Tool Operation and Growth Mechanism
The resource hub now contains a simulation of the operation of the AT400 as well as an advanced molecular simulation of the ALD growth mechanism for an example film material, ZnO.MORE